Atomlagenabscheidungsverfahren

EP 603 41 318.8 – C23C 16/44. AT 21.07.2003; OT 03.10.2007; PT 13.06.2012. Anm.: Micron Technology, Inc., Boise, US. Erf.: Castrovillo, Paul J., BoiseID 83706, US, Sandhu, Gurtej S., BoiseID 83706, US, Derderian, Garo J., BoiseID 83706, US, Basceri, Cem, Reston VA 20190, US.